边缘扭转摩尔图案晶格弛豫的理论研究

Theory for Lattice Relaxation in Marginal Twist Moirés

摘要 Abstract

原子级薄层摩尔材料表现出类似弹性膜的行为,在非常小的扭转角度下,范德华黏附能远超应变能。在“边缘扭转”这一强耦合状态下,低黏附能区域扩展并占据大部分摩尔单元格,而不利能量构型则收缩形成由周期性畴壁连接的拓扑缺陷。我们找到了能够成功描述三角形孤子网络和六角形孤子网络这两种强耦合状态的解析表达式,这些结果与LAMMPS分子动力学模拟预测以及连续弹性理论数值解相匹配。这种现象具有普适性,其理论仅由一个依赖于扭转角的参数表征。我们的理论框架对于理解当前广泛关注的一系列材料实验至关重要,包括扭转双层石墨烯、平行和反平行堆叠的tWSe₂和tMoTe₂,以及其他具有相同堆叠对称性的扭转同质双层材料。

Atomically thin moir\'e materials behave like elastic membranes where at very small twist angles, the van der Waals adhesion energy much exceeds the strain energy. In this ``marginal twist" regime, regions with low adhesion energy expand, covering most of the moir\'e unit cell, while all the unfavorable energy configurations shrink to form topological defects linked by a periodic network of domain walls. We find analytical expressions that successfully capture this strong-coupling regime for both the triangular soliton network and the honeycomb soliton network matching predictions from LAMMPS molecular dynamics simulations, and numerical solutions of continuum elasticity theory. There is an emergent universality where the theory is characterized by a single twist-angle dependent parameter. Our formalism is essential to understand experiments on a wide-range of materials of current interest including twisted bilayer graphene, both parallel and antiparallel stacked tWSe2 and tMoTe2, and any other twisted homobilayer with the same stacking symmetry.

边缘扭转摩尔图案晶格弛豫的理论研究 - arXiv